Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

• Chang-Ming Wang,
• Hong-Sheng Chan,
• Chia-Li Liao,
• Che-Wei Chang and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2023, 14, 34–44, doi:10.3762/bjnano.14.4

• alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest achieved feature dimension is 5 nm using a micrometer-scale structured stamp in a chemical lift-off lithography (CLL) process

• lithography operations and could severely limit the obtainable feature resolution if neglected. Chemical lift-off lithography (CLL) is a rapidly emerging subtractive lithographic technique that aims to overcome the lateral diffusion and gas phase transfer obstacles present in conventional soft lithography [17

• characterized by SEM for feature line width of (B) 150 nm and by AFM for feature line widths (C) 80 nm (D) 50 nm (E) 35 nm, and (F) 5 nm. Scale bar is 2 μm (B) and (C), and 100 nm (D–F). Illustration of the gap-directed chemical lift-off lithography process. (A) The selective removal of alkanethiols from an Au

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• biological species recognition with minimum nonspecific attachment. Herein, a straightforward approach utilizing chemical lift-off lithography to create a diluted self-assembled monolayer matrix for anchoring diverse biological probes is introduced. The strategy encompasses convenient operation, well-tunable

• interaction, but also lower non-specific binding of objects. A highly controllable molecular manipulation over large area surfaces is consequently highly sought after in bioactive substrate fabrication. The recently developed chemical lift-off lithography (CLL) technique is a straightforward approach to

• -defined patterns is anticipated. Schematic illustration and corresponding topographic AFM images of biological-probe-patterned surface fabrication using the chemical lift-off lithography (CLL) process. Different types of bioactive surfaces fabricated by the chemical lift-off lithograpy (CLL) process with

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• during chemical lift-off lithography is a scarcely studied hybrid material. We show that these Au–alkanethiolate layers on poly(dimethylsiloxane) (PDMS) are transparent, functional, hybrid interfaces that can be patterned over nanometer, micrometer, and millimeter length scales. Unlike other ultrathin Au

• being removed by CLL. Although not fully elucidated, we refer to the lifted-off species as a (supported) Au–alkanethiolate monolayer (vide infra). Chemical lift-off lithography differs from other subtractive or deterministic transfer printing techniques [6][19][20][21][22][23] in that the stamp “inks

• experimental and computational strategies to characterize the hybrid Au–alkanethiolate 2D material formed at PDMS surfaces via lift-off lithography. Chemical lift-off lithography was used to pattern featureless (flat) PDMS substrates with Au–alkanethiolate monolayers, which enabled direct characterization of